Synthesis of Carbon Nitride Films by Electron Cyclotron Resonance Sputtering Deposition Method.
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چکیده
منابع مشابه
Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition
Bismuth titanate (Bi,Ti,O,, :BIT) thin films were prepared on the Pt courted MgO(100) substrate by electron cyclotron resonance plasma sputtering-chemical vapor deposition (ECR plasma sputtering-CVD). Bi20, was used as a sputtering target and tetra-isopropoxy-titanium [Ti(i-C3H70)4] as a CVD source. The composition of films was controlled by changing RF power (P,,) of Bi,O, target and Ti source...
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ژورنال
عنوان ژورنال: SHINKU
سال: 1998
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.41.512